High-vacuum and high-temperature universal laboratory furnace has been designed and manufactured. This furnace solves a wide range of experimental and technological issues in the high-temperature (2500 K) synthesis of refractory compounds, growing of oxide and semiconductor crystals, melting of quartz glass.

The furnace has the following features: a feasibility for a fast replacement of heating units of various configurations, including the units involving the methods of material synthesis without crucible; and a shaft with the rotational and translational (up to 200 mm) degrees of freedom. The furnace is equipped with visual systems and instruments to control the processes occurring in the heat cell.