A technology has been created for the multilayer and multicomponent coating deposition on workpieces with a total surface area of 103 cm2. This technology is based on the magnetron sputtering including reactive sputtering. In a working chamber, dense plasma generation by the low-energy electron beam ensures the ion-assisted coating deposition process that increases the coating density and improves the coating adhesion. Multicomponent sputtering targets, a controllable atom-to-ion ratio at the workpiece surface, and adjustable ion energy allow high-performance coatings to be obtained on the basis of a wide variety of metals, nitrides and oxides.
Six flat magnetrons simultaneously operating in a pulse-periodic mode (40 kHz, 12.5 μs) are used to deposit coatings, including dielectric coatings, in inert and reactive gas media. For plasma generation and ion assistance, an electron source based on a gas discharge with a self-heated hollow cathode has been developed, which generates a broad beam (100 сm2) with a beam current up to10 A. The energy and the current density of plasma ions generated by the electron beam are controlled within the range of 10–1000eV and 1–10 mA/cm2, respectively. Deposition methods have been developed for multilayer coatings applied on the current collectors of solid-oxide fuel cells and for corrosion-resistant coatings on the structural steels.
